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Keywords: High K- Metal Gate(HK-MG), Atomic layer deposition, Fermi-Level Pinning(FLP),Strained Silicon,SiGe:C HBT,

Type Title
The Journey of I.C.Technology from micro (1959) to nano (2009) era.-Part 8.
The Journey of I.C.Technology from micro (1959) to nano (2009) era.-Part 8.
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