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About: Precursors for Chemical Vapor Deposition of Copper

Module by: Andrew R. Barron. E-mail the author

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Name: Precursors for Chemical Vapor Deposition of Copper
ID: m25428
Language: English (en)
Subject: Science and Technology
Keywords: acac, carrier gas, chemical vapor deposition, copper, Cu, CVD, deposition, diffusion barrier, Lewis base, ligand, metal, metallization, olefin, phosphine, precursor, PVD, semiconductor, step coverage, surface, thin film, VLSI
License: Creative Commons Attribution License CC-BY 3.0

Authors: Andrew R. Barron (arb@rice.edu)
Copyright Holders: Andrew R. Barron (arb@rice.edu)
Maintainers: Andrew R. Barron (arb@rice.edu)

Latest version: 1.4 (history)
First publication date: May 27, 2009 2:56 pm -0500
Last revision to module: Jul 13, 2009 7:07 pm -0500

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XML: m25428_1.4.cnxml XML that defines the structure and contents of the module, minus any included media files. Can be reimported in the editing interface. Learn more.

Version History

Version: 1.4 Jul 13, 2009 7:07 pm -0500 by Andrew R. Barron
Changes:
update meta file

Version: 1.3 Jun 19, 2009 12:35 pm -0500 by Andrew R. Barron
Changes:
check refs

Version: 1.2 Jun 17, 2009 3:16 pm -0500 by Andrew R. Barron
Changes:
change note

Version: 1.1 Jun 17, 2009 12:55 pm -0500 by Andrew R. Barron
Changes:
1st version

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American Chemical Society (ACS) Style Guide:

Barron, A. Precursors for Chemical Vapor Deposition of Copper, OpenStax-CNX Web site. http://cnx.org/content/m25428/1.4/, Jul 13, 2009.

American Medical Assocation (AMA) Manual of Style:

Barron A. Precursors for Chemical Vapor Deposition of Copper [OpenStax-CNX Web site]. July 13, 2009. Available at: http://cnx.org/content/m25428/1.4/.

American Psychological Assocation (APA) Publication Manual:

Barron, A. (2009, July 13). Precursors for Chemical Vapor Deposition of Copper. Retrieved from the OpenStax-CNX Web site: http://cnx.org/content/m25428/1.4/

Chicago Manual of Style (Bibliography):

Barron, Andrew. "Precursors for Chemical Vapor Deposition of Copper." OpenStax-CNX. July 13, 2009. http://cnx.org/content/m25428/1.4/.

Chicago Manual of Style (Note):

Andrew Barron, "Precursors for Chemical Vapor Deposition of Copper," OpenStax-CNX, July 13, 2009, http://cnx.org/content/m25428/1.4/.

Chicago Manual of Style (Reference, in Author-Date style):

Barron, A. 2009. Precursors for Chemical Vapor Deposition of Copper. OpenStax-CNX, July 13, 2009. http://cnx.org/content/m25428/1.4/.

Modern Languages Association (MLA) Style Manual:

Barron, Andrew. Precursors for Chemical Vapor Deposition of Copper. OpenStax-CNX. 13 July 2009 <http://cnx.org/content/m25428/1.4/>.