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About: Chemical Vapor Deposition

Module by: Andrew R. Barron. E-mail the author

View the content: Chemical Vapor Deposition


Name: Chemical Vapor Deposition
ID: m25495
Language: English (en)
Subject: Science and Technology
Keywords: Arrhenius, boundary layer, bubbler, chemical vapor deposition, CVD, deposition, desorption, diffusion, dopant, growth rate, hydrogen, LACVD, laser, low pressure, mass transport, MOCVD, PACVD, PECVD, physical vapor deposition, plasma, precursor, PVD, pyrolysis, rate limiting step, silicon, substrate, surface, thin film, vapor pressure
License: Creative Commons Attribution License CC-BY 3.0

Authors: Andrew R. Barron (
Copyright Holders: Andrew R. Barron (
Maintainers: Andrew R. Barron (

Latest version: 1.2 (history)
First publication date: May 27, 2009 10:44 am -0500
Last revision to module: Jul 13, 2009 5:58 pm -0500


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Version History

Version: 1.2 Jul 13, 2009 5:58 pm -0500 by Andrew R. Barron
update meta data

Version: 1.1 Jun 18, 2009 8:18 am -0500 by Andrew R. Barron
1st version

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American Chemical Society (ACS) Style Guide:

Barron, A. Chemical Vapor Deposition, OpenStax_CNX Web site., Jul 13, 2009.

American Medical Assocation (AMA) Manual of Style:

Barron A. Chemical Vapor Deposition [OpenStax_CNX Web site]. July 13, 2009. Available at:

American Psychological Assocation (APA) Publication Manual:

Barron, A. (2009, July 13). Chemical Vapor Deposition. Retrieved from the OpenStax_CNX Web site:

Chicago Manual of Style (Bibliography):

Barron, Andrew. "Chemical Vapor Deposition." OpenStax_CNX. July 13, 2009.

Chicago Manual of Style (Note):

Andrew Barron, "Chemical Vapor Deposition," OpenStax_CNX, July 13, 2009,

Chicago Manual of Style (Reference, in Author-Date style):

Barron, A. 2009. Chemical Vapor Deposition. OpenStax_CNX, July 13, 2009.

Modern Languages Association (MLA) Style Manual:

Barron, Andrew. Chemical Vapor Deposition. OpenStax_CNX. 13 July 2009 <>.