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Name: 50 years Journey of IC Technology_Appendix VI+VII_Atomic Layer Deposition+FermiLevelPinnning
ID: m33388
Language: English (en)
Summary: Appendix VI and Appendix VII deal with two major problems of CMOS Technology namely how to achieve smooth and even oxide layer for improved yield and how to prevent Fermi Level Pinning.
Keywords: Atomic Layer Deposition, Fermi Level Pinning, Inter Specefic Region
License: Creative Commons Attribution License CC-BY 3.0

Authors: Bijay_Kumar Sharma (electronics@nitp.ac.in)
Copyright Holders: Bijay_Kumar Sharma (electronics@nitp.ac.in)
Maintainers: Bijay_Kumar Sharma (electronics@nitp.ac.in)

Latest version: 1.1 (history)
First publication date: Jan 10, 2010 7:03 am -0600
Last revision to module: Jan 10, 2010 7:22 am -0600

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Version: 1.1 Jan 10, 2010 7:22 am -0600 by Bijay_Kumar Sharma
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American Chemical Society (ACS) Style Guide:

Sharma, B. 50 years Journey of IC Technology_Appendix VI+VII_Atomic Layer Deposition+FermiLevelPinnning, OpenStax-CNX Web site. http://cnx.org/content/m33388/1.1/, Jan 10, 2010.

American Medical Assocation (AMA) Manual of Style:

Sharma B. 50 years Journey of IC Technology_Appendix VI+VII_Atomic Layer Deposition+FermiLevelPinnning [OpenStax-CNX Web site]. January 10, 2010. Available at: http://cnx.org/content/m33388/1.1/.

American Psychological Assocation (APA) Publication Manual:

Sharma, B. (2010, January 10). 50 years Journey of IC Technology_Appendix VI+VII_Atomic Layer Deposition+FermiLevelPinnning. Retrieved from the OpenStax-CNX Web site: http://cnx.org/content/m33388/1.1/

Chicago Manual of Style (Bibliography):

Sharma, Bijay_Kumar. "50 years Journey of IC Technology_Appendix VI+VII_Atomic Layer Deposition+FermiLevelPinnning." OpenStax-CNX. January 10, 2010. http://cnx.org/content/m33388/1.1/.

Chicago Manual of Style (Note):

Bijay_Kumar Sharma, "50 years Journey of IC Technology_Appendix VI+VII_Atomic Layer Deposition+FermiLevelPinnning," OpenStax-CNX, January 10, 2010, http://cnx.org/content/m33388/1.1/.

Chicago Manual of Style (Reference, in Author-Date style):

Sharma, B. 2010. 50 years Journey of IC Technology_Appendix VI+VII_Atomic Layer Deposition+FermiLevelPinnning. OpenStax-CNX, January 10, 2010. http://cnx.org/content/m33388/1.1/.

Modern Languages Association (MLA) Style Manual:

Sharma, Bijay_Kumar. 50 years Journey of IC Technology_Appendix VI+VII_Atomic Layer Deposition+FermiLevelPinnning. OpenStax-CNX. 10 Jan. 2010 <http://cnx.org/content/m33388/1.1/>.