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Precursors for Chemical Vapor Deposition of Copper (m25428)
Keywords: acac, carrier gas, chemical vapor deposition, copper, Cu, CVD, deposition, diffusion barrier, Lewis base, ligand, metal, metallization, olefin, phosphine, precursor, PVD, semiconductor, step coverage, surface, thin film, VLSI
Subject: Science and Technology
Language: English
Popularity: 78.46%
Revised: 2009-07-13
Revisions: 4
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